| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8030498 | Surface and Coatings Technology | 2013 | 5 Pages |
Abstract
⺠High density RF-DC plasma etching allows us to widen large pressure range. ⺠Plasma diagnosis is equipped with the oxygen etching system. ⺠Fast etching rate is attained by 5 μm/h. ⺠Micro-grooves are homogeneously etched onto DLC coating.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Tatsuhiko Aizawa, Tatsuya Fukuda,