Localised plasma deposition of organosilicon layers on polymer substrates

A new dielectric barrier discharge (DBD) plasma mini reactor was designed which allows in-line patterned deposition of SiOx and SiOxCyHz. Small channels, incorporated in the polymer product or electrode of the reactor, allowed local deposition of the films, using only small amounts of helium and HMDSO. As a test case, the channels of a lab-on-a-chip device were given locally hydrophilic and hydrophobic coatings after bonding of lid and substrate.