| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8030839 | Surface and Coatings Technology | 2012 | 6 Pages |
Abstract
⺠We explore the limits of the hydrogen percentage in Ar-H2-CH4 gas mixtures. ⺠We develop a new kind of buffer layer between the diamond films and treated silicon substrate. ⺠We obtain a low roughness of the coatings without modifying the Astex-type reactor.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
G. Cicala, D. Monéger, D. Cornacchia, P. Pesce, V. Magaletti, G. Perna, V. Capozzi, M. Tamborra,