| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8031480 | Surface and Coatings Technology | 2012 | 5 Pages |
Abstract
⺠Films were prepared by single metallic target mixed with W (1.4%) and V (98.6%). ⺠Films were deposited without substrate temperature and annealed in air atmosphere. ⺠W-V co-sputtered approach improved the surface morphologies of VO2 thin films. ⺠W-V co-sputtered approach reduced the phase transition temperature from 68 °C to 40 °C. ⺠W-V co-sputtered approach narrowed the thermal hysteresis loop from 6 °C to 3 °C.
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Authors
Sheng Zhou, Yi Li, Huiqun Zhu, Ruoxi Sun, Yuming Zhang, Yize Huang, Liu Li, Yujian Shen, Qiuxin Zhen, Guoxiang Tong, Baoying Fang,