| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8031935 | Surface and Coatings Technology | 2011 | 6 Pages |
Abstract
⺠The study of residual stress in ZrO2 thin films deposited by MOCVD. ⺠The stress gradient measurement in thin film by GIXRD. ⺠The stress generation mechanism of ZrO2 film deposited by MOCVD.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Zhe Chen, Nathalie Prud'homme, Bin Wang, Vincent Ji,