| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8032021 | Surface and Coatings Technology | 2011 | 6 Pages |
Abstract
⺠MoS2 clusters are formed in the TiN matrix during sputtering co-deposition process. ⺠MoS2 clusters are nanoscopic in size, homogeneously distributed and mostly amorphous. ⺠Coatings with low MoS2 concentration have potential for wear resistance applications. ⺠The study does not confirm MoS2 formation at grain boundaries. ⺠Neither TiS formation by substitution of S for N in the TiN matrix.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
G. Strapasson, P.C. Badin, G.V. Soares, G. Machado, C.A. Figueroa, R. Hubler, A.L. Gasparin, I.J.R. Baumvol, C. Aguzzoli, E.K. Tentardini,