| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8032068 | Surface and Coatings Technology | 2011 | 7 Pages |
Abstract
⺠The annealing decreases the number of vacancies and voids for all thin films. ⺠Surface roughness of the films depends on the annealing temperature. ⺠Residual stresses decrease for all layers after the annealing process.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Zheng-Han Hong, Shiang-Jiun Lin, Te-Hua Fang, Shun-Fa Hwang,