| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8032195 | Surface and Coatings Technology | 2011 | 7 Pages |
Abstract
âºHigh Me+ bombardment be achieved during HIPIMS etching leads to high adhesion. âºHIPIMS for TiAlCN deposition has shown more metal/gas ion ratio (1:7) than UBMS (1:32). âºHigh metal ion bombardment leads to a very dense coating (no inter-columnar voids). âºThe HIPIMS deposited TiAlCN/VCN coating shows high oxidation resistance (â
 800 °C).
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Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
G. Kamath, A.P. Ehiasarian, Y. Purandare, P.Eh. Hovsepian,