| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8032222 | Surface and Coatings Technology | 2011 | 6 Pages |
Abstract
⺠It is the first report about the adhesion behaviors of ALD Al2O3 on different substrates. ⺠The calculated adhesion energy for Al2O3/SiO2 is fivefold higher than that concerning Al2O3/Si and two order of magnitude higher than that of Al2O3/PI. ⺠The difference between the adhesion energy is related to the different growth mechanisms of Al2O3 on different substrates. There forms a chemical bonding (Si-O-Al) at the interface for Al2O3/SiO2, while the physical bonding for Al2O3/PI and the mixture of chemical and physical bondings for Al2O3/Si.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
J.N. Ding, X.F. Wang, N.Y. Yuan, C.L. Li, Y.Y. Zhu, B. Kan,