Preferred orientation, phase transition and hardness for sputtered zirconium nitride films grown at different substrate biases

Article ID	Journal	Published Year	Pages	File Type
8032242	Surface and Coatings Technology	2011	6 Pages	PDF

Abstract

âº The preferred orientation changes with increasing the substrate bias voltage. âº A high density Zr3N4 phase appears under a high substrate bias voltage. âº The hardness changes due to the variety of structure and grain size of the films.

Keywords

Phase transition Preferred orientation Hardness

Related Topics

Physical Sciences and Engineering Materials Science Nanotechnology

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Preferred orientation, phase transition and hardness for sputtered zirconium nitride films grown at different substrate biases

Authors

Q.N. Meng, M. Wen, C.Q. Qu, C.Q. Hu, W.T. Zheng,