| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8032607 | Thin Solid Films | 2018 | 7 Pages |
Abstract
Knowledge of the changes of optical properties and etching rates induced by electron beam of different exposure doses can be used for fabricating of optical elements by high resolution electron beam lithography.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
P. Janicek, S. Funke, P.H. Thiesen, S. Slang, K. Palka, J. Mistrik, M. Grinco, M. Vlcek,