Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8032676 | Thin Solid Films | 2018 | 38 Pages |
Abstract
SiOx nanowires (SiOxNWs, xâ¯â¤â¯2) were grown by gas-jet electron beam plasma chemical vapor deposition method according to the vapor-liquid-solid mechanism at different synthesis times (tdepâ¯=â¯0.5-5â¯min) using tin particles as a catalyst. Microropes of SiOxNWs were obtained at tdep of more than 1â¯min. The average growth rate of nanowires was about 19â¯nm/s. Fourier transform infrared (FTIR) spectroscopy shows that SiOxNWs synthesized at different tdep are very similar in chemical composition (xâ¯ââ¯2) and in the bonding network of SiOx. FTIR spectroscopy data on the chemical composition of nanowires are in good agreement with the results of X-ray energy dispersive spectroscopy (EDS) analysis. EDS mapping of silicon and oxygen indicates that the atoms are uniformly distributed in the nanowires. Also, FTIR measurements showed that a significant number of water-adsorbing silanol groups formed on the surface of the nanowires. Photoluminescence spectra of nanowires obtained at different tdep are typical of SiO2 and exhibit a broad band in the region 400-600â¯nm centered at ~475â¯nm. The contact angle for SiOxNWs is <21° and decreases to 4.4° with increasing tdep, indicating a superhydrophilic coating.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
A.O. Zamchiy, Ð.Ð. Baranov, S.Ya. Khmel, E.A. Maximovskiy, D.V. Gulyaev, K.S. Zhuravlev,