Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8032688 | Thin Solid Films | 2018 | 8 Pages |
Abstract
Electrical characteristics and deep-level transient spectroscopy of a Ge0.873Si0.104Sn0.023 photodiode grown by ultra-high vacuum chemical vapor deposition on a p++ Ge platform are investigated. The photodiode shows good rectifying I-V characteristics, and the dark current exhibits an activation energy of Edcâ¯=â¯0.43â¯eV at high temperature while the reverse bias leakage current in the film is low but increases with temperature. Capacitance-voltage measurements show the diode has a built-in potential of 0.37â¯V at 300â¯K; the depth profile obtained from capacitance-voltage measurements is in agreement with secondary ion mass spectrometry analysis reported previously. Deep level transient spectroscopy shows two electron traps at ~100â¯K and at ~165â¯K with energy levels at ~0.09â¯eV and ~0.36â¯eV from the conduction band, respectively; and at least one hole trap at ~275â¯K with energy level at ~0.61â¯eV from the valence band (~0.33â¯eV from the conduction band) existing in the device.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Buguo Wang, Z.-Q. Fang, Bruce Claflin, David Look, John Kouvetakis, Yung Kee Yeo,