Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8032729 | Thin Solid Films | 2018 | 18 Pages |
Abstract
Off-stoichiometric Ni-Mn-In films of 500â¯nm thickness were deposited on Si (100) substrate by dc magnetron sputtering at ambient temperature. As-deposited films were annealed ex situ at 550â¯Â°C and 700â¯Â°C for 1â¯h under high vacuum. As-deposited Ni-Mn-In films which were amorphous, exhibited orthorhombic martensite structure upon annealing. The amorphous film was found to be paramagnetic whereas the annealed (martensite) film exhibited weak ferromagnetic behavior. Fe substituted Ni-Mn-In films of the same thickness annealed at 550â¯Â°C exhibited orthorhombic martensite structure, whereas films annealed at 700â¯Â°C exhibited dual phase (cubic L21 austenite and orthorhombic martensite) structure. Martensite Ni-Mn-Fe-In films showed large magnetic moment as compared to the ternary alloy film. Interestingly, films with dual phase structure yielded much higher magnetic moment. Ni-Mn-Fe-In films with higher thicknesses annealed at 700â¯Â°C showed enhanced magnetic moment due to higher L21 phase content in them. Analysis of polar angle variation of resonance field and linewidth of the dual phase Ni-Mn-Fe-In films revealed very low effective perpendicular magnetic anisotropy (3.0â¯Ãâ¯103â¯J/m3) and low Gilbert damping constant (0.009â¯Â±â¯0.001) for the first time. The new results obtained are interpreted in terms of the crystalline nature of the films.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Rajkumar Modak, M. Manivel Raja, V.V. Srinivasu, A. Srinivasan,