Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8033554 | Thin Solid Films | 2016 | 38 Pages |
Abstract
Highly transparent and conductive Al-doped ZnO/Ag/Al-doped ZnO (AZO/Ag/AZO) multilayers were prepared by industrial inline DC magnetron sputtering on glass substrates at room temperature. With optimized film thicknesses of 37 nm/10 nm/37 nm, an optimized low sheet resistance of only 6 Ω/sq. and high transmittances of T550 = 87.4% at 550 nm and T400-800 = 79.9% in the spectral range between 400 nm and 800 nm were reached. Furthermore, an increase of the AZO/Ag/AZO-performance was achieved when a small amount of oxygen was added to the process gas during the AZO deposition which was found to be because of a beneficial adjustment of the AZO dispersion. In this way, owing to both a decreased extinction coefficient as well as a higher refractive index of the AZO film, the maximum transmittance of the AZO/Ag/AZO three-layer structure is further increased (T550 = 89.0%) and the bandwidth of the transmittance range is broadened (T400-800 = 83.3%). With the adaption of the AZO dispersion a very high Figure-of-Merit (Haacke) Φ400-800 = 26.2 mΩâ 1 and Φ550 = 52.9 mΩâ 1 was achieved by industrial inline DC magnetron sputtering process.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Astrid Bingel, Martin Steglich, Philipp Naujok, Robert Müller, Ulrike Schulz, Norbert Kaiser, Andreas Tünnermann,