Article ID Journal Published Year Pages File Type
8034100 Thin Solid Films 2015 5 Pages PDF
Abstract
The dielectric constant for the film samples with thickness (d) lower than 650 nm decreases with the decrease of d. The same behaviour was observed for the conductivity. These results show a dependence of the dielectric permittivity with the thin film thickness. The electrical behaviour was also related with the oxygen partial pressure, whose increment promotes an increase of the Nb2O5 stoichiometry units.
Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
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