| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8034621 | Thin Solid Films | 2015 | 7 Pages |
Abstract
Different deposition methods of nanocomposite silica films with embedded Y2O3:Eu3Â +, Tb3Â + by atmospheric pressure plasma jet (APPJ) technology are presented. We found that a two-step strategy consisting in the APPJ deposition of a silica film on previously deposited nanophosphors is a very efficient method to obtain nanocomposite coatings with excellent adhesion to the substrate. Moreover the APPJ deposited silica film ensures protection of the luminescent nanoparticles and preserves the photoluminescence emission properties of the nanophosphors. Optically active coatings can be therefore deposited by using this technology.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Alice Beggio, Marina Fantin, Paolo Scopece, Alessandro Surpi, Alessandro Patelli, Alvise Benedetti, Davide Cristofori, Francesco Enrichi,