Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8034768 | Thin Solid Films | 2015 | 32 Pages |
Abstract
The effect of deposition rate on the microstructure of Ti thin films prepared by magnetron sputtering was investigated. The microstructure of Ti thin films was characterized by X-ray diffraction (XRD), scanning electron microscopy, transmission electron microscopy and atomic force microscopy. The Ti thin films exhibit a composite structure of amorphous matrix embodied with nanocrystallines. The nanocrystallization is improved with the increase of deposition rate. XRD patterns show that the crystallographic orientation transits from random distribution to (002) preferred orientation, and this crystallographic growth texture is enhanced with increasing deposition rate. Three-dimensional hexagonal particles are formed at the deposition rate of 0.35Â nm/s, while flaky slices occur at the surface at larger deposition rate. Moreover, the growth process of Ti thin films controlled by the deposition rate is discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
A.Y. Chen, Y. Bu, Y.T. Tang, Y. Wang, F. Liu, X.F. Xie, J.F. Gu,