Article ID Journal Published Year Pages File Type
8035089 Thin Solid Films 2014 5 Pages PDF
Abstract
Boron-doped zinc oxide films were fabricated by metal-organic chemical vapor deposition at deposition temperatures (Td) from 150 to 210 °C. The deposition rate increases abruptly and monotonically with increasing Td. The resistivity also varies drastically, and a minimum resistivity of 1.6 × 10− 3Ω cm is obtained at Td = 175 °C. The crystal orientation and surface texture show Td dependence. These characteristics correlate with each other. The dependence of these characteristics on Td is caused by the reactivity of the source materials.
Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
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