Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8035554 | Thin Solid Films | 2014 | 6 Pages |
Abstract
The photoemission yield spectroscopy (PYS) study of the 1-year air-exposed thin 16-nm copper phthalocyanine (CuPc) layers deposited on n- and p-type Si (111) native substrates was presented. The occupied electronic states in the band gap and in the upper part of the valence band have been identified from PYS spectra and their possible origin was discussed. Furthermore, space charge layer electronic parameters of organic thin films and their variations upon the exposure were determined. Different values of work function were received as equal 4.64Â eV and 4.80Â eV for copper phthalocyanine on n-Si substrate and on p-Si one respectively while ionization energies were estimated accordingly as 5.18Â eV and 5.21Â eV. It was found that after the long term air exposure the work function and surface band bending of CuPc increased by 0.94Â eV and 0.56Â eV respectively for the layers on n-Si and by 1.05Â eV and 0.59Â eV for those on p-Si indicated their higher gas sensitivity. Additionally, we detected the significant surface dipole effect on both phthalocyanine samples manifested by strong shift in electron affinity of 0.38Â eV and 0.46Â eV for layers on n-Si and p-Si substrate respectively. To explain these changes we developed the model of CuPc surface-ambient gas electronic interaction.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
L. GrzÄ
dziel, M. Krzywiecki,