| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8036162 | Thin Solid Films | 2013 | 4 Pages |
Abstract
⺠Surface texturing of multicrystalline silicon wafers ⺠Improvement of the trapping of incident light ⺠Random reactive ion etching texturing method using SF6/O2 plasma chemistry ⺠Low cost and high efficiency in conventional industrial production line
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Jinsu Yoo, Jun-Sik Cho, SeJin Ahn, Jihye Gwak, Ara Cho, Young-Joo Eo, Jae-Ho Yun, Kyunghoon Yoon, Junsin Yi,