| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8036418 | Thin Solid Films | 2013 | 5 Pages |
Abstract
In this work we study the influence of the major focused ion beam operating parameters: ion chemical species, beam current, lens voltage and ion dose on the ultimate nanopatterning resolution. We propose a two-step process based on first ion milling of a SiO2 sacrificial layer and second SiO2 chemical etching for the fabrication of nanopatterns with ultimate size/density and ad libitum shape. Examples of resulting patterns are presented.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
A. Benkouider, I. Berbezier, A. Ronda, L. Favre, E. Ruiz Gomes, I.C. Marcus, I. Alonso, A. Delobbe, P. Sudraud,