| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8036432 | Thin Solid Films | 2013 | 4 Pages |
Abstract
Synchrotron X-ray nanodiffraction is used for the position-resolved characterization of a nanocrystalline graded CrNx thin film deposited with continuously increasing nitrogen content over the 6 μm film thickness. The diffraction experiment is performed in wide angle X-ray scattering transmission geometry using a monochromatic beam of 100 nm in diameter. The results reveal a complex microstructure and texture evolution in hexagonal Cr2N and cubic CrNx phases as well as a compressive strain increase in CrNx towards the film surface.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
M. Bartosik, R. Daniel, C. Mitterer, I. Matko, M. Burghammer, P.H. Mayrhofer, J. Keckes,