| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8036442 | Thin Solid Films | 2013 | 7 Pages |
Abstract
The growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Chao Zhao, M.N. Hedhili, Jingqi Li, Qingxiao Wang, Yang Yang, Long Chen, Liang Li,