Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8036501 | Thin Solid Films | 2013 | 7 Pages |
Abstract
The reactive-sputtered polycrystalline Ti1 â xCrxN films with 0.17 â¤Â x â¤Â 0.51 are ferromagnetic and at x = 0.47 the Curie temperature TC shows a maximum of ~ 120 K. The films are metallic at 0 â¤Â x â¤Â 0.47, while the films with x = 0.51 and 0.78 are semiconducting-like. The upturn of resistivity below 70 K observed in the films with 0.10 â¤Â x â¤Â 0.47 is from the effects of the electron-electron interaction and weak localization. The negative magnetoresistance (MR) of the films with 0.10 â¤Â x â¤Â 0.51 is dominated by the double-exchange interaction, while at x = 0.78, MR is related to the localized magnetic moment scattering at the grain boundaries. The scaling ÏxyA/n â Ïxx2.19 suggests that the anomalous Hall effect in the polycrystalline Ti1 â xCrxN films is scattering-independent.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
X.F. Duan, W.B. Mi, Z.B. Guo, H.L. Bai,