Structural and optical characteristics of filtered vacuum arc deposited N:TiOx thin films

Transmission data indicated that the average transmission of films deposited at lower N2 partial pressures (< 41%) was approximately 80%, and it decreased to ~ 50% for higher %N2. The absorption edge of the films shifted to longer wavelengths with increased substrate temperature and %N2, from ~ 380 nm up to ~ 485 nm for films deposited with 41%N2 and a substrate temperature of 500 °C.