Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8036678 | Thin Solid Films | 2013 | 5 Pages |
Abstract
Thin films of vanadium arsenide were deposited via the dual-source atmospheric pressure chemical vapour deposition reactions of VCl4 or VOCl3 with tBuAsH2. Using the vanadium precursor VCl4, films were deposited at substrate temperatures of 550-600 °C, which were black-gold in appearance and were found to be metal-rich with high levels of chlorine incorporation. The use of VOCl3 as the vanadium source resulted in films being deposited between 450 and 600 °C and, unlike when using VCl4, were silver in appearance. The films deposited using VOCl3 demonstrated vanadium to arsenic ratios close to 1:1, and negligible chlorine incorporation. Films deposited using either vanadium precursor were identified as VAs using powder X-ray diffraction and possessed borderline metallic/semiconductor resistivities.
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Authors
Tegan Thomas, Christopher S. Blackman, Ivan P. Parkin, Claire J. Carmalt,