| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8036946 | Thin Solid Films | 2013 | 6 Pages |
Abstract
⺠Electrochromic amorphous WO3 films were deposited by gas flow sputtering. ⺠Deposition rates were 160-270 nm/min, much higher than for conventional sputtering. ⺠The colouration efficiency was comparable to that for conventional sputtering.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
N. Oka, M. Watanabe, K. Sugie, Y. Iwabuchi, H. Kotsubo, Y. Shigesato,