| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8036975 | Thin Solid Films | 2013 | 6 Pages |
Abstract
⺠CdS films deposited using continuous microreactor-assisted solution deposition (MASD) ⺠Dense nanocrystallite CdS films can be reached at a rate of 25.2 [nm/min]. ⺠MASD can approach higher film growth rate than conventional chemical bath deposition.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Yu-Wei Su, Sudhir Ramprasad, Seung-Yeol Han, Wei Wang, Si-Ok Ryu, Daniel R. Palo, Brian K. Paul, Chih-hung Chang,