| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8036986 | Thin Solid Films | 2013 | 5 Pages |
Abstract
⺠Silicon oxynitride and silicon oxycarbide processes were compared. ⺠Coatings were grown by atmospheric pressure chemical vapor deposition. ⺠Growth rate can be controlled with deposition temperature and silane concentration. ⺠Film composition and its optical properties depend on the amount of precursors used.
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Authors
M.N. Saarniheimo, E.T. Seppäläinen,