| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8037009 | Thin Solid Films | 2013 | 4 Pages |
Abstract
⺠The electrical asymmetry effect technique tested for thin silicon film deposition ⺠Bias voltage has an influence on film uniformity. ⺠Minimized the deterioration of layer uniformity while increasing discharge frequency
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
D. Hrunski, A. Janssen, T. Fritz, T. Hegemann, C. Clark, U. Schreiber, G. Grabosch,