| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8037110 | Thin Solid Films | 2013 | 7 Pages |
Abstract
⺠TiO2 film structure was modified by rf-assistance to dc and pulsed dc sputtering. ⺠Optical index increased in particular at high discharge pressures by rf-assistance. ⺠Effectiveness of rf-assistance was discussed in the basis of film property change.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Mune-aki Sakamoto, Eiji Kusano, Hiroaki Matsuda,