| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8037151 | Thin Solid Films | 2013 | 8 Pages |
Abstract
⺠Distinguishing between chemical and purely defect-related implantation effects ⺠Layer geometry and microstructure of the deposited and ion-irradiated layers ⺠Variation of the electric and optical resistivity as function of ion fluence and type ⺠Opto-electric properties in terms of plasma energy and electron relaxation time
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
M. PopoviÄ, M. NovakoviÄ, A. Traverse, K. Zhang, N. BibiÄ, H. Hofsäss, K.P. Lieb,