| Article ID | Journal | Published Year | Pages | File Type | 
|---|---|---|---|---|
| 8037159 | Thin Solid Films | 2013 | 5 Pages | 
Abstract
												⺠Ga and Al doped ZnO thin films were prepared by hetero targets sputtering system. ⺠Free electrons were increased due to the continuous substitutions of Ga and Al. ⺠Crystallinity was improved by recombination of particles with increasing of temperature.
											Keywords
												
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											Authors
												JeongSoo Hong, Nobuhiro Matsushita, KyungHwan Kim, 
											