| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8037160 | Thin Solid Films | 2013 | 8 Pages |
Abstract
⺠Atomic layer deposition used to deposit Rh, Pd, and Pt films below 200 °C. ⺠Noble metal film growth examined using ozone and molecular H2 as reactants. ⺠Deposition of palladium oxide films with ozone.
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Authors
Jani Hämäläinen, Esa Puukilainen, Timo Sajavaara, Mikko Ritala, Markku Leskelä,