| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8037219 | Thin Solid Films | 2013 | 8 Pages |
Abstract
⺠Thermal stability and grain growth kinetics of RuAl thin films were studied. ⺠Annealing temperatures between 650 and 750 °C were used for the study. ⺠Grain size (GS) was determined by image analysis. ⺠GS was also calculated using X-ray and electron backscatter diffraction measurements. ⺠The activation energy for grain growth in nanocrystalline RuAl was also estimated.
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Authors
M.A. Guitar, K. Woll, E. Ramos-Moore, F. Mücklich,