| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8037230 | Thin Solid Films | 2013 | 5 Pages |
Abstract
⺠We deposited RuS2 thin films by reactive magnetron sputtering at 30 < T < 450 °C. ⺠Film growth was observed with in-situ real-time energy-dispersive X-ray diffraction. ⺠In-situ and ex-situ measurements show a Ru-rich seed layer in the RuS2 films. ⺠Film resistivities vary within orders of magnitude with deposition temperature.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
S. Brunken, A. Kratzig, P. Bogdanoff, S. Fiechter, K. Ellmer,