| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8037571 | Thin Solid Films | 2013 | 5 Pages |
Abstract
⺠Exposure to liquids changes the physical structure of nanorod thin films. ⺠This effect prevents lithographic processing of such thin films. ⺠CO2 critical point drying technique (CPD) prevents the structure of such films. ⺠Results would enable wet lithographic processing of these films. ⺠CO2 CPD minimizes the surface tension effects of the liquids on such thin films.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Piyush J. Shah, Zhi Wu, Andrew M. Sarangan,