| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8037667 | Ultramicroscopy | 2018 | 23 Pages |
Abstract
Extensive optical calculations are reported. Aberrations of the micro-mirrors were analyzed by numerical calculation. Dispersion and aberrations of the deflectors were calculated by using an analytical field model. Combination aberrations caused by the off-axis position of dispersive rays in the mirrors and objective lens were also analyzed. It is concluded that the proposed corrector system will be a promising candidate for simple and low-cost aberration correction in low-voltage SEMs.
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Physical Sciences and Engineering
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Authors
Hideto Dohi, Pieter Kruit,