Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8038021 | Ultramicroscopy | 2016 | 5 Pages |
Abstract
We present an intensity distribution analysis of cathodoluminescence (CL) excited with a focused electron beam in a luminescent thin film. The energy loss distribution is applied to the developed analysis method in order to determine the arrangement of the dipole locations along the path of the electron traveling in the film. Propagating light emitted from each dipole is analyzed with the finite-difference time-domain (FDTD) method. CL distribution near the film surface is evaluated as a nanometric light source. It is found that a light source with 30Â nm widths is generated in the film by the focused electron beam. We also discuss the accuracy of the developed analysis method by comparison with experimental results. The analysis results are brought into good agreement with the experimental results by introducing the energy loss distribution.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Masahiro Fukuta, Wataru Inami, Atsushi Ono, Yoshimasa Kawata,