| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8038540 | Ultramicroscopy | 2012 | 11 Pages |
Abstract
⺠Various obstacles need to be overcome before Boersch phase plates can be used routinely. ⺠Technical problems include electrostatic charging, mechanical drift, and image artefacts. ⺠Contamination of Boersch phase plates is analysed by XPS and AES. ⺠Low-voltage electron microscopy reduces obliteration of low spatial frequencies. ⺠Single-sideband contrast and mechanical drift are handled by automatic image processing.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Andreas Walter, Heiko Muzik, Henning Vieker, Andrey Turchanin, André Beyer, Armin Gölzhäuser, Manfred Lacher, Siegfried Steltenkamp, Sam Schmitz, Peter Holik, Werner Kühlbrandt, Daniel Rhinow,