A large deflection and high payload flexure-based parallel manipulator for UV nanoimprint lithography: Part I. Modeling and analyses

•A new flexure-based parallel manipulator that delivers θx–θy–Z motion.•A new generic theoretical model for analyzing the deflection stiffness of any form of flexure configuration.•Comparisons of theoretical predictions via different types of theoretical models on the stiffness characteristics of various types of compliant joint modules.•New theoretical model provides accurate predictions on the deflection stiffness of the proposed compliant joint modules.

This paper presents a flexure-based parallel manipulator (FPM) that delivers nanometric co-planar alignment and direct-force imprinting capabilities to automate an ultra-violet nanoimprint lithography (UV-NIL) process. The FPM is articulated from a novel 3-legged prismatic-prismatic-spherical (3PPS) parallel-kinematic configuration to deliver a θx–θy–Z motion. The developed FPM achieves a positioning and orientation resolution of ±10 nm and 0 . 05″ respectively, and a continuous output force of 150 N/Amp throughout a large workspace of 5°×5°×5 mm. Part I mainly focuses on a new theoretical model that is used to analyze the stiffness characteristics of the compliant joint modules that formed the FPM, and experimental evaluations of each compliant joint module. Part II presents the stiffness modeling of the FPM, the performance evaluations of the developed prototype, and the preliminary results of the UV-NIL process.