| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8039618 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2016 | 8 Pages |
Abstract
Evolution of chemical states and defect structure in titanium during low energy nitrogen ion implantation by Plasma Immersion Ion Implantation (PIII) process is studied. The underlying process of chemical state evolution is investigated using secondary ion mass spectrometry and X-ray photoelectron spectroscopy. The implantation induced defect structure evolution as a function of dose is elucidated using variable energy positron annihilation Doppler broadening spectroscopy (PAS) and the results were corroborated with chemical state. Formation of 3 layers of defect state was modeled to fit PAS results.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
P.A. Manojkumar, V.A. Chirayath, A.K. Balamurugan, Nanda Gopala Krishna, S. Ilango, M. Kamruddin, G. Amarendra, A.K. Tyagi, Baldev Raj,