On the effective sputter yield during magnetron sputter deposition

The effective sputter yield during magnetron sputtering of elemental targets was measured by weighing the target before and after sputtering at constant discharge voltage. During the experiment, the pressure and discharge current were logged. The effective sputter yield is compared with a set of published semi-empirical equations to calculate the sputter yield for ion/solid interactions. The differences between both yields are discussed based on different contributions which affect the effective sputter yield such as redeposition, the target roughness and the contribution of high energetic neutrals.