Sputtering of Au surfaces at realistic dose rates using molecular dynamics and on-the-fly kinetic Monte Carlo

We present results from computer simulation of the sputtering of an Au(0 1 0) crystal surface under 500 eV ion bombardment at realistic dose rates for doses up to 1014 ions cm−2. Molecular dynamics is used to calculate the fast ballistic collision processes while an on-the fly kinetic Monte Carlo technique is used to model the relaxation and diffusion processes between successive ion impacts. The results indicate a remarkable degree of crystalline recovery between impacts, no large sub-surface defect accumulation and a saturation of the surface roughness.