Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8043983 | Vacuum | 2018 | 26 Pages |
Abstract
The magnetron discharge with uncooled Cu target has been investigated in a wide range of parameters (magnetic field, power, Ar pressure). The evolution of discharge voltage and current has been measured yielding the transition time to stable gasless self-sputtering regime of 175â¯sâ¯at 2.5â¯kW total power. I-V curves for the solid- and liquid-target magnetron discharge have been obtained, and the magnetic field magnitude has been optimized to ensure both highest attainable power density (600â¯W/cm2) and high discharge voltage (â¼ 800â¯V) for the best sputtering efficiency. The spatial distributions of electron temperature and plasma density were systematically measured at different power values spanning from cold solid target to completely molten one. It has been shown that in the transition region plasma density grows unevenly with discharge power. Eventually, maximum densities of around 3â¯Ãâ¯1011â¯cmâ3 were recorded 5â¯cm away from the target. In the gasless self-sputtering mode, the deposition rate at 26â¯cm above the target increased 40-fold as compared to solid target performance under the same power conditions.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Andrey V. Kaziev, Alexander V. Tumarkin, Kseniya A. Leonova, Dobrynya V. Kolodko, Maxim M. Kharkov, Dmitry G. Ageychenkov,