Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8044053 | Vacuum | 2018 | 7 Pages |
Abstract
This paper described a high power impulse magnetron sputtering preparation of ultrathin polycrystalline VO2(M) thin film (<10â¯nm) on the quartz glass substrate. Combined with our experimental results, we find out that the integral visible transmittance changes with the thickness, and the ultrahigh transmittance values of 75.8% and 77.1% are obtained for the insulator and metal states, respectively. These results represent the best data for VO2 films to date. At lower substrate temperature, the room temperature structures for thicker films and thinner films are VO2(M) and VO2(B), respectively. The thinner VO2(M) films can only be successfully prepared by elevating substrate temperature to 485â¯Â°C. The phase transition temperature of the VO2(M) films shows little change with thickness at the same deposition temperature. In addition, the integral visible transmittance exceeds 54.8% for the thinner films deposited at 485â¯Â°C. Therefore, they are perfect smart window materials that need high visible transmittance.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Tiegui Lin, Yufen Zhang, Decong Zheng,