Nanocluster size dependence of electronic properties of Ta, Mo, Co, and Ni thin films formed by magnetron sputtering

The results of the study of electron properties evolution with nanocluster size of monodispersed thin films consisting of Ta, Mo, Co and Ni metal nanoclusters deposited onto the SiO2/Si(001) surface with magnetron sputtering method are presented. The changes in chemical composition and electron structure of the samples were controlled by means of X-ray photoelectron spectroscopy in the UHV analysis chamber of the Multiprobe MXPS RM VT AFM-25 surface analysis system. Susceptibility to oxidation after exposure to atmosphere was studied.