Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8044911 | Vacuum | 2016 | 5 Pages |
Abstract
We have measured the band offsets of sputtered ZrSiO4 on bulk ZnO wafers using X-Ray Photoelectron Spectroscopy and obtained the bandgaps of these two materials using reflection electron energy loss spectroscopy. The valence band offset was determined to be â0.60 eV ± 0.04 eV for ZrSiO4 on ZnO, while the respective bandgaps were 3.22 eV for ZnO and 5.9 eV for ZrSiO4. The conduction band offset for ZrSiO4/ZnO was then determined to be 3.28 eV. The ZrSiO4/ZnO system has a staggered, type II alignment. This means that while ZrSiO4 may be useful for surface passivation applications on ZnO, it is not suitable for thin film transistors where a positive valence band offset is needed.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
David C. Hays, B.P. Gila, S.J. Pearton, Byung-Jae Kim, F. Ren,