Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8044935 | Vacuum | 2015 | 5 Pages |
Abstract
We produced a VHF H2 plasma (frequency, 60Â MHz) by a narrow-gap discharge and examined the plasma parameters as a function of pressure and power, where two parallel plate electrodes (400Â ÃÂ 300Â mm2) were used. The plasma density reached a peak at a certain pressure, and when the power was increased, the peak pressure at which the density reached this peak shifted to higher pressures. Measured sheath potentials were lower than the theoretical values while the electron temperature was relatively high. An estimation of plasma uniformity was attempted by measuring the ion saturation current distribution, and the uniformity of about 4% was achieved.
Keywords
Related Topics
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Materials Science
Surfaces, Coatings and Films
Authors
Cheng-Yang Lien, Chia-Fu Chen, Ching-Lung Yang, Yoshinobu Kawai, Kuo-Feng Chiu, Jen-Bin Shi, Jui-Hao Wang, Shui-Yang Lien, Yu-Jer Tsai, Ting-Kuei Lien,